SparkNano’s LabLine series delivers industry-leading Spatial Atomic Layer Deposition (S-ALD) systems, combining superior fi lm quality with the fastest deposition speeds and unmatched fl exibility. These advanced systems are designed to support a wide range of S-ALD processes and accommodate various substrate types, making them the ideal solution for R&D, process development, product development, and even pilot-line production. Furthermore, the LabLine systems are fully scalable, bridging the gap between laboratory research and full-scale manufacturing,
ensuring a smooth and seamless transition to commercial production. The LabLine system is composed of several key components, each designed to deliver maximum performance and fl exibility for a variety of S-ALD applications. These components can be customized or upgraded based on specifi c process requirements, ensuring the system adapts to your evolving needs.